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A. Dehoff, M. Reetz, K. Wandel, R. Wolf

Plasma Process Technology for Micromechanic Measuring Structures

Plasma processes are successfully used in the fabrication of mechanical microstructures (MEMS). In describing the fabrication of microbeams as test structures for an optical 3D inspection system, we present plasma processes for anisotropic etching of silicon, the deposition of low temperatur silicon nitride, and the generation of holographic grids using ion beam etching.

tm – Technisches Messen, Oldenbourg Wissenschaftsverlag

Print ISSN: 0171-8096
Volume: 68, 02/2001
Pages: 57

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